Hui Ye (葉輝,Yip Fei) Professor in Department of Optical Engineering, Zhejiang University. He received the B.S. degree in Department of Material Science and Engineering, Zhejiang University, in 1990; and received the Ph.D degree in Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Science, in 1995. Dr.Ye then joined Institute of Optoelectronic Display, Zhejiang University. He was a visiting scholar in Department of Material Science and Engineering at University of California, Los Angeles (UCLA) from Dec.1998 to Dec.1999, and was a research associate in Department of Applied Physics at Hong Kong Polytechnic University from Nov.2000 to May. 2001, respectively. Dr. Ye was financially supported by National Basic Research Program of China, National Natural Scientific Foundation of China (NSFC) and NSF of Zhejiang Province, he has published more than 60 papers as the first/corresponding author. His research interest is focused on silicon photonics, including: (1) Growth of Si/Ge quantum dots and Si/Ge epitaxial films with the MBE method, (2) Light emiting enhancement based on surface plasmon resonance, (3) Fabrication and characterization of novel surface plasmonic materials, (4) Deposition and optical properties study of silicon based ferroelectric films and piezoelectric films.
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